The NexION® 5000 multi-quadrupole ICP-MS – the first in its category to boast four quads – is innovatively designed to meet and exceed the demanding requirements of ultra-trace elemental applications. It takes ICP-MS performance beyond traditional triple quad to deliver exceptionally low background equivalent concentrations (<1 ppt, even in hot plasma) and outstanding detection limits, key to ensuring accurate, repeatable results. Plus, the NexION 5000 provides superior interference removal, phenomenal stability and unmatched matrix tolerance.
In addition to boasting four quads, the NexION 5000 is also the proud recipient of two first place awards: Wiley Analytical Science Award and The Analytical Scientist Innovation Award.
Please enter valid quantity
Please log in to add favorites.
NULL OR EMPTY CART
The NexION 5000 ICP-MS is equipped with a host of new and proprietary technologies which together surpass traditional triple-quad capabilities and redefine your expectations:
|Product Brand Name||NexION|
Concern about air pollution has been growing rapidly, with most of the focus on gaseous pollutants. Airborne particulates, especially small ones, are rapidly gaining attention due to their impact on human health, as smaller particles can be carried over long distances by wind and penetrate deep into the lungs, where contaminants can have direct interaction with lung tissue and the associated blood vessels. Airborne particulates are classified as PM10 for those with aerodynamic diameters less than 10 µm and PM2.5 for those with aerodynamic diameters less than 2.5 µm.
PM2.5 regulations have been implemented throughout the world, and in order to implement a regime to reduce the concentration of PM2.5, it is important to determine the origins of these particulates, hence the need to collect and analyze them.
ICP-MS is often the analytical instrument of choice for such applications due to its low detection limits and wide linear dynamic range. This work describes the collection, sample preparation and inorganic elemental analysis of atmospheric PM10 and PM2.5 using PerkinElmer’s NexION® ICP-MS.
Since ultrapure water (UPW) is used throughout the semiconductor industry in a variety of applications, impurities need to be controlled as these will directly impact the quality and overall yield of semiconductor products. ICP-MS is often used to accurately quantify sub-ppt concentrations of impurities due to its ability to provide accurate quantification of elements at low concentrations.
This work demonstrates the fast, ultratrace analysis of elements whose detection limits are often compromised by argon-based interferences in UPW using the NexION 5000 Multi-Quadrupole ICP-MS. The use of hydrogen and a single plasma mode (Cold Plasma) allowed for analysis times as short as 116 seconds per sample to be achieved, supporting the rapid response needs for UPW analysis in semiconductor laboratories.
Nitric acid is widely used throughout the semiconductor and electronics industry. Various purity grades are required depending on the application and the intended use. For this reason, the semiconductor industry has required ever-lower detection of a broad range of impurities, including non-metallic elements, in nitric acid solutions in order to meet manufacturing requirements.
Due to the presence of complex spectral interferences resulting from plasma gases and the sample matrix, low-ppt quantification of non-metallic elements in dilute nitric acid can be challenging using conventional ICP-MS. This issue is easily addressed with an ICP-MS system that not only mass filters the ions before they enter the collision-reaction cell but also controls the reaction in the cell, a feature only available in quadrupole cells. This works describes a mixed-mode method to determine detection limits and background equivalent concentrations of non-metallic impurities in a dilute nitric acid solution leveraging the unique capabilities of the NexION® 5000 Multi-Quadrupole ICP-MS.
As semiconductor manufacturing processes are being performed at increasing micro-levels, the demand for ICP-MS instrumentation capable of analyzing non-metallic elements at ultra-trace concentrations has grown. For these applications, the use of an ICP-MS system with a full-length resolving quadrupole before the collision/reaction cell as well as the capability to control the reaction within the cell can dramatically improve detection limits, allowing the detection and quantification of non-metallic elements at low levels.
This work demonstrates the ability of the NexION® 5000 ICP-MS to determine DLs and BECs of typical non-metal contaminants in sulfuric acid solutions, achieving excellent detection limits thanks to the combination of its multi-quad capabilities and other proprietary technologies.
For many years, inductively coupled plasma mass spectrometry (ICP-MS) has been the tool of choice for the trace analysis of elements like lead (Pb), arsenic (As), mercury (Hg), and copper (Cu) in bodily fluids such as urine, blood, serum and saliva, as well as in tissues.
Blood and serum are two common biological fluids which present challenges for trace metal analysis. Blood is a complex mixture, composed mostly of water, but also contains proteins, glucose, mineral salts, hormones, as well as red and white blood cells. Serum is derived from blood and has a similar composition, although it does not contain red or white blood cells or fibrinogens.
This work demonstrates the ability of PerkinElmer’s NexION® 5000 multi-quadrupole ICP-MS to perform reproducible analyses of blood samples with outstanding stability over long sample run times, thanks to its winning combination of reaction and collision capabilities with triple quadrupole technology for spectral interference removal – this design allows for the accurate determination of low and high levels of analytes in a single analytical run.
The most commonly used organic chemicals in integrated circuit (IC) fabrication are isopropyl alcohol (IPA), propylene glycol methyl ether acetate (PGMEA), propylene glycol methyl ether (PGME), and n-methyl pyrrolidone (NMP). These solvents can leave behind organic film residues with metallic and non-metallic contamination on the wafers, so high-purity grades are mandated for advanced semiconductor processes.
This application note describes the analysis of 46 elements in IPA, PGMEA and NMP using the NexION® 5000 Multi-Quadrupole ICP-MS. This platform is the first in its category to boast four quads, delivering exceptionally low background equivalent concentrations and outstanding detection limits, enabling the semiconductor industry to quantify contaminants in acidic, basic, and organic chemicals at extremely low levels.
Contaminants in chemicals used during manufacturing processes have a direct impact on product yield and reliability of semiconductor devices. Within the whole process of integrated circuit manufacturing, wafers are sent for repeated cleaning using hydrogen peroxide (H2O2). Semiconductor Equipment and Materials International (SEMI) standard for H2O2, SEMI C30-1110 - Specifications for Hydrogen Peroxide SEMI Grade 51, specifies maximum contamination levels of 10 ppt for most trace elements.
In this application note, we describe the analysis of 46 elements in 35% H2O2 using the NexION® 5000 Multi-Quadrupole ICP-MS, which offers the ability within a single analysis to determine non-metallic elements down to ppt levels together with other trace metals down to sub-ppt levels. This capability is critical in the analysis of trace contaminants in H2O2, which is used in multiple stages of the wafer fabrication process.
For decades, the semiconductor industry has been designing new devices that are smaller, faster and consume less power than their predecessors. To maintain this trend, the critical features of these devices must also become smaller and have fewer defects. The small diameter of a chip’s features requires the use of higher purity materials. As a result, all liquid chemicals and solid materials used in semiconductor processes should contain extremely low levels of contaminants.
Ultrapure water (UPW) is one of the most essential chemicals in the production of semiconductor devices and is used extensively for all wet-processing steps, including wafer rinsing and the dilution of compounds used in chemical baths.
This application note describes a method for the characterization of UPW using PerkinElmer's NexION® 5000 multi-quadrupole ICP-MS, demonstrating outstanding analytical performance in terms of detection limits (DLs) and background equivalent concentrations (BECs) thanks to its four quadrupoles and a wide range of other technological advantages.
Copper (Cu) is widely used due to its high electrical and thermal conductivity, strong corrosion resistance, excellent workability and moderate strength. It is one of the few metals used most commonly in its pure form, and ultra-pure copper specifically is the standard material used in the bonding wire of most integrated circuits and the cables for audio devices. However, the presence of impurities, such as bromine (Br), in high-purity copper reduces its electrical and thermal conductivity to varying degrees and is a limiting factor on the material’s quality.
This work demonstrates the ability of the NexION® 5000 Multi-Quadrupole ICP-MS to accurately measure bromine in high-purity copper by removing the copper-based interference on bromine.
During the production of semiconductor devices, it is crucial to ensure that the silicon wafers are free of contaminants and impurities. The use of high-purity chemicals during the cleaning process is critical to the semiconductor product’s overall quality and performance. Therefore, it is essential to analyze electronic-grade hydrochloric acid (HCl) and hydrogen peroxide for the presence of trace metal contaminants.
This work demonstrates the extreme power of the NexION® 5000 multi-quadrupole ICP-MS to remove interferences in order to achieve low background equivalent concentrations in electronic-grade hydrochloric acid for all analytes.
Rare earth elements (REEs) exhibit many optical, electrical, and magnetic properties, and therefore play an irreplaceable role in high-tech photoelectromagnetic materials. At present, the widely used color TV phosphors, Ni-H batteries, high-performance magnetic materials, etc. are all examples of rare earth elements in high-tech applications. The application of high-purity REEs is mainly concentrated in luminescent materials as well as high-tech fields of electronic as well as giant magnetostrictive materials.
High-purity europium oxide (Eu2O3) is used to make color powder, energy-saving lamp powder, self-luminous powder, etc., for displays. The high-definition display (HDP) currently being developed and used requires higher purity and particle size, and its demand is also greater. Therefore, high-purity rare earth analysis and detection technology is also facing technological innovation as the application demand increases.
This work demonstrates the direct determination of 14 REEs in high-purity Eu2O3 with the NexION® 5000 Multi-Quadrupole ICP-MS by eliminating matrix-based interferences.
Most of the copper (Cu) concentrates produced globally contain some impurities, which can affect the price as copper concentrates containing high levels of impurities are not accepted by some smelters. To permit treatment and to maximize the value of a Cu concentrate, the levels of impurities in the concentrate need to be reduced below the limits set by the smelters and, in some cases, the authorities in the producing and receiving countries.
In order to measure the lowest possible levels of impurities, ICP-MS is required, as it is capable to accurately measure in the parts per trillion (ppt) range. However, to achieve these levels, both polyatomic and doubly charged interferences must be dealt with. This work demonstrates the accurate and reliable quantification of impurities in Cu concentrate using the NexION® 5000 ICP-MS, thanks to the combination of its unique multi-quadrupole capabilities and Universal Cell Technology, proven to be effective at removing spectral interferences.
The production of electronic devices is a complex process that requires the use of ultra-pure chemicals during the manufacturing steps. High-purity-grade sulfuric acid (H2SO4) is generally used for cleaning components and etching all metal and organic impurities on silicon wafers.
Impurities in sulfuric acid, or any other chemicals used in semiconductor fabrication, can critically impact device quality and yield. This work describes the analysis of 52 elements in high-purity sulfuric acid using the NexION® 5000 Multi-Quadrupole ICP-MS, which delivers the outstanding analytical performance required by the semiconductor industry for difficult matrices such as 10% H2SO4.
As the limits of detection (LODs) for trace metal analysis are increasingly being pushed to the next decimal, a need exists to meet these new detection requirements without compromising accuracy or precision. Inductively coupled plasma mass spectrometry (ICP-MS) is often the technique of choice for routine applications requiring ultra-trace detection limits.
For a number of elements, spectroscopic interferences can have a significant impact on the ability to achieve low detection limits by traditional ICP-MS systems. In this study, we take a look at multi-quadrupole ICP-MS technology, with a focus on the mechanisms of removing spectral and other interferences to secure the LODs, accuracy, and precision needed for challenging applications.
Read this article to learn more about multi-quadrupole ICP-MS technology and its benefits.
It’s clear, glass has a variety of uses, from practical to technological to decorative. In particular, float glass is widely used in architecture, automotive, transportation, photovoltaic, and solar industries.
For glass testing labs around the world, we offer highly accurate and tailored solutions including instrumentation, accessories, software, and services, to ensure you get the most out of your analysis. Focused and flexible, our technology enables glass manufacturers to determine efficient energy storage and test raw materials for the required properties. We provide industry-trusted solutions that align with the latest glass regulations (EN, ISO, and CIE), improving the flow and productivity of your lab. Download our Interactive Brochure to learn more.
In the fast-paced analytical world, accurate and reproducible results are essential to guaranteeing quality and ensuring safety. What many industries have in common is the need for trace-element analysis with superior interference removal, extremely low detection limits, and outstanding background equivalent concentrations (BECs).
That’s the thinking behind the NexION® 5000, the industry's first multi-quadrupole ICP-MS instrument. This cutting-edge system delivers performance beyond high-resolution ICP-MS and traditional triple quad technology.
Discover the unique benefits of the NexION 5000 ICP-MS. Download the interactive brochure.
Laboratories conducting trace-elemental analyses require high-performance instrumentation capable of delivering accurate and reproducible results, even at low concentrations. Find out how recent developments in multi-quadrupole ICP-MS technology address these evolving needs.
Download this ebook to learn how multi-quadrupole technology in the award-winning NexION® 5000 ICP-MS will meet and exceed your lab’s testing requirements.
Quality control-monitoring and testing are important in ensuring the quality of palm oil. The quality control parameters are used to judge the quality of palm oil products and it can be monitored and tested to ensure that the palm oil is not deliberately or accidentally adulterated.
Perfect for your most challenging applications, PerkinElmer’s cutting-edge NexION® 5000 Multi-Quadrupole ICP-MS is the industry’s first and only four-quadrupole ICP-MS instrument – taking performance well beyond everyday triple-quad technology. And the scientific community is taking notice, as the NexION 5000 has already garnered two coveted first-place awards from respected organizations:
Read this flyer to learn more about this award-winning solution.
Look to PerkinElmer for all of your consumables and supplies for your NexION 1000, 2000, or 5000 ICP-MS system.
This document provides information to assist in preparing your laboratory for the PerkinElmer NexION® 5000 ICP-MS system prior to instrument delivery and installation.
The novel design of the second-generation Triple Cone Interface with patent-pending OmniRing™ was developed specifically for the NexION® 5000 multi-quadrupole ICP-MS with both sensitivity and stability in mind. It builds on the Triple Cone Interface geometry of the NexION series and provides unique solutions to space-charge effects based on the simple, yet highly effective OmniRing technology. Its design focuses on many attributes of an ideal interface for ICP-MS, most notably improved transmission by reducing the ion current while at the same time providing a controlled acceleration of the ions through the interface without transmitting high energy ions into the downstream ion optics. The result is much improved analyte signal intensities without the cost of elevated background levels, delivering the ability to analyze complex matrices at sub-ppt BECs and with robust plasma conditions. In addition to high sensitivity, it also significantly contributes to the unmatched stability of the NexION 5000 ICP-MS with challenging matrices. This is thanks to three stages of differential pumping and a design that minimizes surfaces prone to sample deposition and ion sputtering, such as those using extraction cones and lenses.
Unlike other ICP-MS systems on the market that utilize conventional 40-MHz or 27-MHz commercially available generators which are typically customized and modified to work with ICP-MS instruments, the NexION® 1000/2000/5000 ICP-MS systems feature a 34-MHz frequency free-running RF generator, which was developed specifically for applications using ICP-MS systems. This state-of-the-art RF generator offers a trouble-free user experience, featuring adjustable power with 1 watt increments from 400 to 1600 watts. The accurate impedance matching of this system allows the plasma to quickly adjust to changing sample matrices, ensuring that sensitivity is maintained.
Learn more about the novel 34-MHz RF generator of the NexION 1000/2000/5000 ICP-MS - download this technical note.
PerkinElmer’s AMS system provides a number of benefits to simplify analysis of high-matrix samples with theNexION family of ICP-MS instruments. By introducing a flow of argon into the spray chamber neck, the aerosol stream is diluted,allowing for more efficient ionization, fewer matrix effects, and less deposition on the interface cones, which results in simplifiedsample preparation and higher quality data.
Interferences will always occur in ICP-MS and need to be dealt with. However, the NexION® 5000 multi-quadrupole ICP-MS with quadrupole Universal Cell is able to effectively and reproducibly remove spectral interferences leading to improved accuracy, repeatability and reproducibility, while solving problems difficult for single-quadrupole or even high-resolution ICP-MS instruments.
Download this technical note to learn more about the superior interference removal capabilities of the NexION 5000 ICP-MS, leveraging the unique combination of multi-quadrupole technology, Universal Cell Technology and other proprietary features.
With the onset of the COVID-19 pandemic, the use of face masks by the general public has become a critical personal protective measure to minimize person-to-person transmission. While health care workers use medical or surgical masks, the general population uses non-medical, otherwise known as hygienic, face masks to greatly reduce the transmission of SARS-CoV-2 by capturing droplets and aerosols from those infected with the virus.
In response to the increased demand for both the number and variety of non-medical face masks, many companies are now producing them to meet the public’s need, and with this great variety, the quality and the safety of the face masks must be assessed. This work describes the considerations surrounding metal analysis in hygienic face masks used to prevent the spread of COVID-19.